Manufacturers of semiconductor devices and polycrystalline silicon are using various solutions in their decontamination process of different tooling. Especially in production equipment where depositions occurs must be kept extremely clean to prevent contamination.
Dry ice cleaning is a process that removes the residue left behind by rubber and tire molds. This can be done manually, but the use of more sophisticated equipment makes it easier to clean molds effectively, avoiding damage to the product.
The main purpose of dry ice cleaning is to remove contaminants from your mold so that you get good quality products that meet customer expectations in terms of appearance and performance. It is also used for ensuring fine details on your products are not affected by contamination particles when they come out of the molding machines or during transportation.
Removal of build-up in, CVD reactors, Diffusion parts, Polish parts, Photo parts, Etch parts
The use of dry ice is entirely safe for the environment, the machinery, and the user.
Here's why dry ice cleaning equipment is so effective:
Dry ice cleaning can be accomplished quickly and does not require changing any components or adding liquids or solvents to the machine during use. This reduces both costs associated with labor and time spent maintaining equipment compared to other methods such as liquid nitrogen blasting or brushing products onto rubber molds in order to remove debris from them.
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Dry ice cleaning uses solid CO, a non-abrasive media that won't damage surfaces or equipment. The super cooled dry ice pellets or particles are accelerated at supersonic speeds and sublimate on impact, resulting in the surface being cleaned, lifting dirt and contaminants off the underlying substrate.
Instead of abrasive media to grind surfaces (and damage them), SPECCo2 uses dry ice (Solid CO2) accelerated at supersonic speeds that sublimate upon impact and lift contaminants from substrates.
See our dry ice solutions in action for the Semiconductor industry Industry
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